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HIGH TEMP HOT PLATE/

High-temperature heating stages adopt high-conductivity non-metallic ceramic panels, featuring no oxidation under extreme heat, thermal conductivity close to aluminum plates, superior heat transfer, corrosion resistance and permanent anti-deformation performance. Vacuum pumping and nitrogen / other inert gas filling functions are supported, with temperature control range from ambient temperature up to 900℃. The 800℃ heating stage reaches 800℃ from room temperature within 20 minutes. Custom sizes and temperature ranges are available upon customer demand. 800℃ High Temperature Vacuum Heating Stage 1. High Insulation & Programmable Controller Advantages High insulation isolation between heating chuck and main equipment body prevents host damage caused by ultra-high temperature. High-performance programmable controller supports heating, holding and cooling segments (max 30 programmable steps) for full automatic thermal…

  • Product Details

High-temperature heating stages adopt high-conductivity non-metallic ceramic panels, featuring no oxidation under extreme heat, thermal conductivity close to aluminum plates, superior heat transfer, corrosion resistance and permanent anti-deformation performance. Vacuum pumping and nitrogen / other inert gas filling functions are supported, with temperature control range from ambient temperature up to 900℃. The 800℃ heating stage reaches 800℃ from room temperature within 20 minutes. Custom sizes and temperature ranges are available upon customer demand.

800℃ High Temperature Vacuum Heating Stage

1. High Insulation & Programmable Controller Advantages

High insulation isolation between heating chuck and main equipment body prevents host damage caused by ultra-high temperature. High-performance programmable controller supports heating, holding and cooling segments (max 30 programmable steps) for full automatic thermal cycling. We are a professional heating plate manufacturer with 10 years independent R&D & in-house production capacity. Contact us for complete technical datasheets and custom solutions.high temp hot plate

2. Structure & Core Features of 800℃ Heating Stage

Full stainless steel housing; temperature controller connected via dual plug-in cables. Custom multi-segment programmable thermal profiles including heating, soaking and cooling stages. Supports vacuum evacuation and nitrogen/inert gas purging, temperature control range: ambient ~ 800℃.

  1. User-friendly operation, compact structure, equipped with 100mm observation window, fully compatible with glove box processing workflow.
  2. Superior heating surface uniformity, high temperature control precision, anti-deformation & anti-corrosion; fast ramp rate and multi-segment programmable temperature regulation.
  3. Customizable temperature ranges, dimensions and functional modules per customer specifications.
  4. Vacuum chamber: stainless steel; top cover: high-grade aluminum alloy.
  5. Standard accessories: 1 pressure gauge, 1 KF vacuum angle valve, 1 gas inlet valve, 1 vent valve, 1 KF16 gas inlet port, 1 KF25 reserved port, 1 temperature control cabinet, 1 corrugated tube.

3. Application Range

Suitable for semiconductor silicon wafers, glass slides, chips, substrates, ITO conductive glass processes: thin film baking & curing after photoresist coating. Widely used in industrial factories, scientific research institutes and universities for thermal aging tests, drying, baking and high-temperature heat treatment for production, R&D and teaching experiments.high power hot plate

4. Complete Model Configuration Parameters

Parameter Item ET-150200ZK ET-600LDQF ET-220KJ
Temperature Control Range Ambient ~ 800℃ Ambient ~ 600℃ Ambient ~ 300℃
Heating Area (mm) 160×160 160×160 220×220
Effective Constant Temp Zone (mm) 160×160 100×100 220×220
Temperature Resolution 0.1℃ 0.1℃ 0.1℃
Temperature Control Accuracy ±1%℃ ±1%℃ (in inert gas) ±1%℃
Control Mode 30 linear programmable segments 30 linear programmable segments 6 storage programs, 30 heating segments per recipe
Surface Uniformity ±1%℃ ±1%℃ ±1%℃
Heating Panel Material Aluminum embedded ceramic panel 309S special stainless steel Hard anodized aluminum
Timer Range 1 min ~ 999.9 min 1 min ~ 999.9 min 1 min ~ 999.9 min
Observation Window Diameter (mm) 100 N/A N/A
Power Supply AC220V 50Hz AC220V 50Hz AC220V 50Hz
Max Power 500W 600W 800W
Overall Dimension (mm) 210×210×165 230×190×185 400×300×290
Net Weight 28 Kg 6 Kg 15 Kg

5. Ceramic Heating Plate Thermal & Mechanical Material Properties

Material Property Index Technical Value Range
Bulk Density 3.0 ~ 3.6 g/cm³
Elastic Modulus 300 ~ 350 GPa
Specific Heat Capacity 4.8 ~ 6.6 J/(g·℃)
Thermal Conductivity 120 ~ 180 W/(m·K)
Compressive Strength 100 ~ 200 MPa
Volume Resistivity 5 × 10⁻¹² Ω·cm
Average Linear Thermal Expansion Coefficient 4.0 ~ 4.6 ×10⁻⁶ /℃
Vickers Hardness (HV) 600 ~ 700 HV
Melting Point 1750℃
Max Continuous Operating Temp 1350℃
Corrosion Resistance Excellent
Machinability Low precision machining performance
Water Resistance Strictly avoid moisture during heating operation
High-Temperature Burst Failure Rate 0.015%
Anti-Oxidation Temperature Limit 1600℃
Minimum Machinable Dimension 3.0 mm

safest hot plate

The 800℃ heating stage reaches 800℃ from ambient temperature within 20 minutes. High thermal insulation isolation separates heating chuck and machine body to protect main equipment from high temperature damage. High-performance programmable controller supports 30 independent heating/holding/cooling program segments with full automatic thermal cycle programming. We own 10 years professional heating plate R&D & manufacturing experience with full independent design and production. Contact our technical team for complete technical drawings and detailed parameter support.Customer Case

ETOOL | Professional Custom High Temperature Vacuum Ceramic Heating Stage for Semiconductor Wafer Processing

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