The nitrogen-filled programmable photoresist bake hot plate is equipped with a sealed cover and nitrogen inlet port to deliver uniform nitrogen flow inside the chamber and form stable inert shielding atmosphere. This high-precision programmable curing platform integrates motorized lifting pins, vacuum wafer adsorption and linear ramp temperature control functions. Customizable proximity-mode baking lifting structure facilitates timing and easy wafer loading/unloading. The lifting motion supports 5-step programming, with storage capacity for up to 100 independent baking recipes. Max baking temperature reaches 800℃ (ultra-high temperature versions available on request). Temperature control accuracy within ±0.5℃, temperature resolution 0.1℃, surface temperature uniformity less than 1% across the heating platen.
Nitrogen Purified Programmable Photoresist Bake Hot Plate
1. Core Functional Features
Built-in vacuum adsorption system activates automatically when lift pins approach the heating surface to prevent wafer sliding and guarantee full tight contact with the platen. Linear ramp temperature control adjusts heating output automatically for linear temperature rise, ramp rate adjustable from 0.1~15℃/min with up to 10 segmented temperature zones programmable.
The 800℃ high-temperature model adopts high thermal conductivity non-metallic ceramic heating plate, heat resistant and discoloration-free under extreme heat. Cabinet housing adopts coated stainless steel treatment for anti-oxidation and anti-discoloration performance. High-temperature coiled heating elements deliver long service life and outstanding uniform heat distribution.
2. Full Product Specifications & Configuration
- 1. Hard anodized anti-corrosion aluminum heating platen
- 2. 7-inch full-color touchscreen operation with advanced PLC control system
- 3. Embedded installation design to lower overall operating height
- 4. Automatic motorized lifting pins to realize proximity low-contact baking mode
- 5. Support linear temperature ramp mode and vacuum wafer adsorption function
- 6. Optional auxiliary functions: exhaust ventilation, nitrogen purging, PDMS curing atmosphere supply
- 7. Standard heating platen dimension: 220mm × 220mm square (Model ET100-PA)
3. Standard Model Technical Parameters
- 1. Larger platen size: 340mm × 340mm square (Model ET200-PA)
- 2. Power Input: ET100-PA: AC220V 1000W; ET200-PA: AC220V 3500W
- 3. Temperature range: Ambient ~ 300℃; Temperature resolution: 0.1℃
- 4. Temperature control accuracy: ±0.2℃; Surface temperature uniformity: ＜±1%
- 5. Storage for 100 baking recipes, each recipe supports 5 independent heating stages
- 6. Motorized lift pin adjustable stroke: 0~30mm; lift height resolution: 0.1mm
- 7. Compatible wafer diameter: substrates over 40mm / 120mm; custom sizes available for special requirements
- 8. Overall outer dimension: 360mm(W) × 530mm(D) × 415mm(H)
4. Full Series Model Comparison Parameter Table
| Parameter Item | ET5 | ET6 | ET10 | ET100-SE | ET100-PE | ET200-SE | ET200-PE | ET5-HT | ET100-HT | ET100-HT-TM | ET200-HT-TM |
|---|---|---|---|---|---|---|---|---|---|---|---|
| Effective Platen Size (inch) | 5″ | 6″ | 8″ | 8″ | 8″ | 12″ | 12″ | 5″ | 8″ | 8″ | 12″ |
| Max Temp (℃) | 300 | 300 | 300 | 300 | 300 | 300 | 300 | 600 | 600 | 600 | 600 |
| Temp Resolution (℃) | 0.1 | 0.1 | 0.1 | 0.1 | 0.1 | 0.1 | 0.1 | 0.1 | 0.1 | 0.1 | 0.1 |
| Temp Accuracy (℃) | ±1 | ±0.2 | ±1 | ±0.2 | ±0.2 | ±0.2 | ±0.2 | ±0.5 | ±0.5 | ±0.5 | ±0.5 |
| Temp Uniformity (%) | ±1 | ±1 | ±1 | ±1 | ±1 | ±2 | ±2 | ±4 | ±4 | ±4 | ±5 |
| Constant Timing Function | No | No | No | Yes | Yes | Yes | Yes | No | No | Yes | Yes |
| Linear Ramp Control | No | Yes | No | No | Yes | No | Yes | No | No | Yes | Yes |
| Vacuum Adsorption | No | Yes | No | No | Yes | No | Yes | No | No | No | No |
| Lift Pin System | No | No | No | Yes | Yes | Yes | Yes | No | No | No | No |
| Programmable Lifting Cycles | N/A | N/A | N/A | 5 steps, 100 recipes | 5 steps, 100 recipes | 5 steps, 100 recipes | 5 steps, 100 recipes | N/A | N/A | N/A | N/A |
| Linear Ramp Segments | N/A | N/A | N/A | N/A | 10 steps, 100 recipes | N/A | 10 steps, 100 recipes | N/A | N/A | 20 steps, 100 recipes | 20 steps, 100 recipes |
| Temp Deviation Alarm | No | No | No | Yes | Yes | Yes | Yes | No | No | Yes | Yes |
| HMI Interface | Segment LCD | Segment LCD | Segment LCD | Touchscreen | Touchscreen | Touchscreen | Touchscreen | Segment LCD | Segment LCD | Touchscreen | Touchscreen |
| Platen Material | Hard Anodized Al | Hard Anodized Al | Hard Anodized Al | Hard Anodized Al | Hard Anodized Al | Hard Anodized Al | Hard Anodized Al | Ceramic | Ceramic | Ceramic | Ceramic |
| Cabinet Material | Brushed SS | Anodized Al | Brushed SS | Brushed SS | Brushed SS | Brushed SS | Brushed SS | Coated SS | Coated SS | Coated SS | Coated SS |
| Rated Power (W) | 800 | 800 | 1000 | 1000 | 1000 | 3500 | 3500 | 1600 | 2500 | 2500 | 5000 |
| Embedded Mount | No | No | No | Yes | Yes | No | No | No | No | No | No |
| Overall Dim (mm) | 180×180×250 | 369×270×126 | 250×270×250 | 303×446×295 | 303×446×295 | 423×562×295 | 423×562×295 | 245×347×352 | 245×347×352 | 245×347×352 | 423×550×490 |
| Remarks | Lab & Teaching Entry Model | High-end programmable series, expandable with exhaust, vacuum, nitrogen purge & HMDS gas supply | High-temperature ceramic series | ||||||||
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